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¾ÅÐãÖ±²¥ logo is 67 microns wide making it the smallest ¾ÅÐãÖ±²¥ logo ever using electron beam lithography and metal deposition.

Sci '21 Year Crest is 40 microns using electron beam lithography and metal deposition.

NFK logo is 25 microns using electron beam lithography and metal deposition.

An example of a cross hatch (18 nanometers across) in the flower of the ¾ÅÐãÖ±²¥ logo making it the smallest feature within the designs.

Sarah Choudhury, working as a SWEP-funded summer student at the lab created these images using electron beam lithography and deposition of a thin metal film.

On the engineering facebook page, Sarah writes:

This summer I worked as a SWEP student for NanoFabrication Kingston at Innovation Park. I've been working with some really awesome technology but one of the best things I've done is to make super-tiny logos and designs with the electron beam lithography tool we have here. I made the Sci '21 Year Crest, the ¾ÅÐãÖ±²¥ logo, and the NanoFabrication Kingston logo about one quarter the width of a human hair. The ¾ÅÐãÖ±²¥ logo is 67 microns wide, the Sci '21 Year Crest is 40 microns, and the NFK logo is 25 microns. The smallest features within these designs are 18 nanometers across: the cross-hatch in the flower of the ¾ÅÐãÖ±²¥ logo, for example.